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Preparation and characterization of tantalum-doped indium tin oxide films deposited by magnetron sputtering

✍ Scribed by Bo Zhang; Xianping Dong; Xiaofeng Xu; Jiansheng Wu

Book ID: 113896984
Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 436 KB
Volume: 58
Category: Article
ISSN: 1359-6462
DOI: 10.1016/j.scriptamat.2007.09.028

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