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Preparation and characterization of hydrogenated diamond-like carbon films in a dual DC-RF plasma system

โœ Scribed by Li, Hongxuan; Xu, Tao; Chen, Jianmin; Zhou, Huidi; Liu, Huiwen

Book ID
121389473
Publisher
Institute of Physics
Year
2003
Tongue
English
Weight
329 KB
Volume
36
Category
Article
ISSN
0022-3727

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Carbon nitride films (CN x films) were deposited on Si(1 0 0) substrates making use of dual direct current radio frequency (DC-RF) plasma enhanced chemical vapor deposition (PECVD), using a mixed gas of CH 4 and N 2 as the source gas. The microstructures, morphologies, and compositions of the result