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Preionization of XeF excimer laser by 248 nm laser beam

✍ Scribed by G. Maulhardt; K. Schmidt; U. Bartuch; W. Viöl

Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
138 KB
Volume
4
Category
Article
ISSN
1612-2011

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✦ Synopsis

A new type of preionization setup for a XeF excimer
laser was investigated. The laser gas was ionized using a 248 nm
laser beam.

The preionization laser beam follows the optical axis of the XeF
laser resonator thereby ionizing the laser gas.

The timing of the ionizing beam with respect to the main discharge
has a great influence on laser output energy and stability. To
achieve optimum performance the preionization laser pulse should
occur about 90 ns prior to the ignition of the main discharge of
the XeF laser. The optimal energy density of the pre-ionizing beam
was found to be around 10 mJ/cm^2^.

By direct comparison to a standard preionization setup using a
corona discharge along the main discharge region, the pulse energy
of the XeF laser could be increased. However, the stability could
not be improved.

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We report on the activation of Mg acceptors in Mg-doped GaN films, grown by metalorganic chemical vapor deposition, via the use of a pulsed KrF (248 nm) excimer laser irradiation. The as-grown GaN : Mg, which was irradiated by the KrF excimer laser at a laser energy density of 590 mJ/cm 2 in a N 2 a