Excimer-laser-induced etching of silicon in chlorine atmosphere at a wavelength of 248 nm

✍ Scribed by W. Jiang; H. Baumgärtner; I. Eisele

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 423 KB
• Volume: 86
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/0169-4332(94)00440-4