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Preferential sputtering effects in tantalum nitride thin films

✍ Scribed by C Palacio; J.M Sanz; J.M Martínez-Duart


Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
241 KB
Volume
124
Category
Article
ISSN
0040-6090

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Thin films of CN x were deposited by reactive r.f.-magnetron sputtering on Si(100) substrates. The effect of annealing temperatures on the structural properties of the films has been studied by Fourier transform infrared (FTIR) spectroscopy, x-ray photoelectron spectroscopy (XPS) and transmission el