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Precision plasma etching of Si, Ge, and Ge:P by SF6 with added O2

✍ Scribed by Wongwanitwattana, Chalermwat; Shah, Vishal A.; Myronov, Maksym; Parker, Evan H. C.; Whall, Terry; Leadley, David R.

No coin nor oath required. For personal study only.

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