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Modification of Si(100)-Surfaces by SF6 Plasma Etching — Application to Wafer Direct Bonding

✍ Scribed by M. Reiche; U. Gösele; M. Wiegand


Publisher
John Wiley and Sons
Year
2000
Tongue
English
Weight
423 KB
Volume
35
Category
Article
ISSN
0232-1300

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