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Polymers of α-substituted benzyl methacrylates as a new type of electron-beam resist

✍ Scribed by Koichi Hatada; Tatsuki Kitayama; Shigeru Danjo; Yutaka Tsubokura; Heimei Yuki; Kazuyuki Moriwaki; Hiroaki Aritome; Susumu Namba

No coin nor oath required. For personal study only.

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