Vanadium dioxide films were deposited using reactive RF-magnetron sputter deposition technique and characterized without or with post-annealing process for the application of thermal sensors. The film thickness variation on a 4-in wafer was less than 72%. As-deposited film showing an abrupt metal-in
โฆ LIBER โฆ
Polymerization of acrylonitrile using magnetron deposition technique
โ Scribed by V. S. Shirodkar; R. T. Jathar; A. M. Bapat; S. D. Kulkarni; N. V. Bhat
- Book ID
- 101584879
- Publisher
- John Wiley and Sons
- Year
- 1994
- Tongue
- English
- Weight
- 363 KB
- Volume
- 53
- Category
- Article
- ISSN
- 0021-8995
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