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Polycyanoacrylate electron beam resists deposited by the Langmuir–Schaefer technique

✍ Scribed by V.I. Troitsky; N.K. Matveeva

Book ID: 114086576
Publisher: Elsevier Science
Year: 1998
Tongue: English
Weight: 62 KB
Volume: 327-329
Category: Article
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(98)00735-4

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