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Polycrystalline-Silicon LPCVD by Propene-Assisted Silane Pyrolysis: A Study of the Process and the Films

✍ Scribed by V. G. Erkov; S. F. Devyatova

Book ID
110394175
Publisher
Springer
Year
2002
Tongue
English
Weight
60 KB
Volume
31
Category
Article
ISSN
1063-7397

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The surface topography and structure of low-pressure chemical vapour-deposited silicon Ðlms grown on the thermal oxide of (100) silicon substrates have been investigated using atomic force microscopy. The measurements have been performed on undoped as-grown samples with deposition temperatures betwe