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Poly(alkenylsilane sulfone)s as positive electron beam resists for two-layer systems

✍ Scribed by Antoni S. Gozdz; Harold G. Craighead; Murrak J. Bowdkn

Publisher: Society for Plastic Engineers
Year: 1986
Tongue: English
Weight: 822 KB
Volume: 26
Category: Article
ISSN: 0032-3888
DOI: 10.1002/pen.760261609

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