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PLISD: a new high-vacuum sputtering technique for thin film deposition

โœ Scribed by L. Shi


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
396 KB
Volume
40
Category
Article
ISSN
0042-207X

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๐Ÿ“œ SIMILAR VOLUMES


Plasma vac sputtering unit for thin-film
โœ Consolidated Vacuum Corporation (a division of Bell & Howell) Rochester; NY; ๐Ÿ“‚ Article ๐Ÿ“… 1965 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 367 KB