✦ LIBER ✦

Plasma vac sputtering unit for thin-film deposition

✍ Scribed by Consolidated Vacuum Corporation (a division of Bell & Howell) Rochester; NY; USA

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Thin film sputter deposition for hybrid

✍ P. Muralt; J.P. Seidel 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 253 KB

Origin of gas impurities in sputtering p

✍ M. Andritschky 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 486 KB

Optimal magnetron sputtering parameters

✍ EK Hollmann; AG Zaitsev 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 477 KB

PLISD: a new high-vacuum sputtering tech

✍ L. Shi 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 396 KB

Plasma Processes in Activated Thin Film

✍ A. Lunk; M. Schmidt 📂 Article 📅 1988 🏛 John Wiley and Sons 🌐 English ⚖ 870 KB

Radiofrequency reactive sputtering for d

✍ J. Duchêne 📂 Article 📅 1971 🏛 Elsevier Science 🌐 English ⚖ 490 KB