PLISD: a new high-vacuum sputtering technique for thin film deposition : L. Shi. Vacuum 40(4), 395 (1990)

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 127 KB
• Volume: 31
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(91)90461-f