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Plasma spectroscopy—Glow discharge deposition of hydrogenated amorphous silicon

✍ Scribed by Akihisa Matsuda; Kazunobu Tanaka


Publisher
Elsevier Science
Year
1982
Tongue
English
Weight
943 KB
Volume
92
Category
Article
ISSN
0040-6090

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Dopant concentration measurements in hyd
✍ J.C. Zesch; R.A. Lujan; V.R. Deline 📂 Article 📅 1980 🏛 Elsevier Science ⚖ 350 KB

R.f. glow discharge optical spectroscopy (GDOS) is demonstrated to be a useful technique with which to measure absolute dopant concentrations in hydrogenated amorphous silicon (a-Si:H) films. The measurement technique and method of calibration are described. GDOS measurements of boron concentrations