Plasma Sources for Thin Film Deposition and Etching
β Scribed by Maurice H. Francombe and John L. Vossen (Eds.)
- Year
- 1994
- Tongue
- English
- Leaves
- 331
- Series
- Physics of Thin Films 18
- Category
- Library
No coin nor oath required. For personal study only.
β¦ Table of Contents
Content:
Contributors to This Volume
Page ii
Front Matter
Page iii
Copyright page
Page iv
Contributors
Page ix
Preface
Pages xi-xii
M.H. Francombe, J.L. Vossen
Design of High-Density Plasma Sources for Materials Processing
Pages 1-119
MICHAEL A. LIEBERMAN, RICHARD A. GOTTSCHO
Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films
Pages 121-233
OLEG A. POPOV
Unbalanced Magnetron Sputtering
Pages 235-288
SUZANNE L. ROHDE
The Formation of Particles in Thin-Film Processing Plasmas
Pages 289-318
CHRISTOPH STEINBRΠΡCHEL
Author Index
Pages 319-321
Subject Index
Pages 323-328
π SIMILAR VOLUMES
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