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Plasma Sources for Thin Film Deposition and Etching

✍ Scribed by Maurice H. Francombe and John L. Vossen (Eds.)


Year
1994
Tongue
English
Leaves
331
Series
Physics of Thin Films 18
Category
Library

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✦ Table of Contents


Content:
Contributors to This Volume
Page ii

Front Matter
Page iii

Copyright page
Page iv

Contributors
Page ix

Preface
Pages xi-xii
M.H. Francombe, J.L. Vossen

Design of High-Density Plasma Sources for Materials Processing
Pages 1-119
MICHAEL A. LIEBERMAN, RICHARD A. GOTTSCHO

Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films
Pages 121-233
OLEG A. POPOV

Unbalanced Magnetron Sputtering
Pages 235-288
SUZANNE L. ROHDE

The Formation of Particles in Thin-Film Processing Plasmas
Pages 289-318
CHRISTOPH STEINBRΠ“ΡšCHEL

Author Index
Pages 319-321

Subject Index
Pages 323-328


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