Laser Processing of Thin Films and Microstructures: Oxidation, Deposition and Etching of Insulators

✍ Scribed by Dr. Ian W. Boyd (auth.)

• Publisher: Springer-Verlag Berlin Heidelberg
• Year: 1987
• Tongue: English
• Leaves: 327
• Series: Springer Series in Materials Science 3
• Edition: 1
• Category: Library

✦ Synopsis

This text aims at providing a comprehensive and up to date treatment of the new and rapidly expanding field of laser pro­ cessing of thin films, particularly, though by no means exclu­ sively, of recent progress in the dielectrics area. The volume covers all the major aspects of laser processing technology in general, from the background and history to its many potential applications, and from the theory to the necessary experimental considerations. It highlights and compares the vast array of processing conditions now available with intense photon beams, as well as the properties of the films and microstructures pro­ duced. Separate chapters deal with the fundamentals of laser interactions with matter, and with experimental considerations. Detailed consideration is also given to film deposition, nuclea­ tion and growth, oxidation and annealing, as well as selective and localized. etching and ablation, not only in terms of the various photon-induced processes, but also with respect to traditional as well as other competing new technologies.

✦ Table of Contents

Front Matter....Pages I-VIII
Introduction....Pages 1-14
Interactions and Kinetics....Pages 15-99
Experimental Considerations....Pages 100-133
Laser-Assisted Oxidation and Nitridation....Pages 134-189
Passivation by Laser Annealing and Melting....Pages 190-208
Laser-Induced Deposition....Pages 209-235
Material Removal....Pages 236-271
Summary and Conclusions....Pages 272-286
Back Matter....Pages 287-320

✦ Subjects

Optics, Optoelectronics, Plasmonics and Optical Devices