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Plasma processing: a novel method to reduce the transient enhanced diffusion of boron implanted in silicon

✍ Scribed by Giovanni Mannino; Francesco Priolo; Vittorio Privitera; Enrico Napolitani; Alberto Carnera

Book ID: 114170525
Publisher: Elsevier Science
Year: 1999
Tongue: English
Weight: 439 KB
Volume: 147
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(98)00547-3

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