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Plasma process induced damages on n-MOSFET with plasma oxidized and nitrided gate dielectrics

✍ Scribed by T.S. Jang; M.H. Ha; K.D. Yoo; B.K. Kang

Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 443 KB
Volume: 75
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2004.07.067

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