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Plasma etching of submicron devices: in situ monitoring and control by multi-wavelength ellipsometry

✍ Scribed by H.L. Maynard; N. Layadi; J.T.C. Lee

Book ID: 114086345
Publisher: Elsevier Science
Year: 1998
Tongue: English
Weight: 613 KB
Volume: 313-314
Category: Article
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(97)00854-7

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