✦ LIBER ✦
7387. An investigation of the roughening of silicon(100) surfaces in Cl2/CCl4 reactive ion etching plasmas by in situ ellipsometry and quadropole mass spectrometry: the role of CCl4: D J Thomas et al, J Vac Sci Technol, B8, 1990, 516–522
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 153 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0042-207X
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