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Plasma etching of films at high rates : R. A. H. Heinecke. Solid St. Technol. p. 104 (April 1978)

Book ID: 103276022
Publisher: Elsevier Science
Year: 1978
Tongue: English
Weight: 121 KB
Volume: 18
Category: Article
ISSN: 0026-2714
DOI: 10.1016/0026-2714(78)90320-7

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