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Plasma-enhanced chemical vapour deposition of thin films from tetraethoxysilane and methanol: optical properties and XPS analyses

✍ Scribed by L. Zajíčkova; I. Ohlídal; J. Janča

Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
997 KB
Volume
280
Category
Article
ISSN
0040-6090

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## Abstract Plasma‐enhanced (PE) CVD from α‐methylstyrene is a dry method for synthesizing directly patternable sacrificial materials for generating pores or air dielectric layers. Films deposited at low power excitation (40 W) decompose between 65 °C and 75 °C, leave minimal residue following a 40