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Plasma diagnostics of a d.c. arcjet chemical vapor deposition diamond reactor

โœ Scribed by S.W. Reeve; W.A. Weimer


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
466 KB
Volume
236
Category
Article
ISSN
0040-6090

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We have investi ated the effects of reactant residence time on the properties of microwav+a88isted CV % diamond films. Using a constant process pressure of 40 Torr and gas composition of 1% CHb in Hr? the total gas flow rate was adjusted from 25 to 800 seem. For OUT reactor, this correspond8 to res