Plasma chemistry and diagnostic in an Ar–N 2 –H 2 microwave expanding plasma used for nitriding treatments
✍ Scribed by Touimi, S; Jauberteau, J L; Jauberteau, I; Aubreton, J
- Book ID
- 120518069
- Publisher
- Institute of Physics
- Year
- 2010
- Tongue
- English
- Weight
- 349 KB
- Volume
- 43
- Category
- Article
- ISSN
- 0022-3727
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📜 SIMILAR VOLUMES
Nitriding treatments using various (Ar-N 2 -H 2 ) gas mixtures are performed on thin molybdenum films coated on Si (100) substrates, in an expanding microwave plasma reactor. The electron density measured in (Ar-25%N 2 -30%H 2 ) and (Ar-8%N 2 -10%H 2 ) plasma as well as the electron energy distribut
## Abstract Boron nitride (BN) films with high crystallinity and phase purity (>80 %) in the cubic phase were synthesized over large areas using fluorine chemistry and electron–cyclotron resonance (ECR) microwave plasma. Plasma‐enhanced fluorine chemistry was provided by a complex H~2~–BF~3~–N~2~–A