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Plasma-assisted deposition techniques for hard coatings

โœ Scribed by R.F. Bunshah; C. Deshpandey


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
567 KB
Volume
41
Category
Article
ISSN
0042-207X

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๐Ÿ“œ SIMILAR VOLUMES


Plasma-assisted chemical vapour depositi
โœ K.-T. Rie; A. Gebauer ๐Ÿ“‚ Article ๐Ÿ“… 1991 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 542 KB

In this work the use of two metallo-organic compounds, titanium tetrakisdialkylamides, was investigated with a pulsed d.c. plasma-assisted chemical vapour deposition process to deposit layers on steel substrates and hard metals. The layers have been studied by scanning electron microscopy X-ray diff