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Plasma assisted CVD of TiS2

โœ Scribed by S. Kikkawa; R. Shimanouchi-Futagami; M. Koizumi


Publisher
Springer
Year
1989
Tongue
English
Weight
803 KB
Volume
49
Category
Article
ISSN
1432-0630

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Combustion assisted (CA) CVD is one of a range of CVD methods that have been used successfully to grow diamond films on a range of substrates. Of critical interest is the role of interfacial carbides in the nucleation and adhesion of diamond at the substrate/film interface. Deposition experiments wi