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Plasma analysis for the plasma immersion ion implantation processing by a PIC-MCC simulation

✍ Scribed by Y. Miyagawa; M. Ikeyama; S. Miyagawa; M. Tanaka; H. Nakadate

Book ID: 108107436
Publisher: Elsevier Science
Year: 2007
Tongue: English
Weight: 631 KB
Volume: 177
Category: Article
ISSN: 0010-4655
DOI: 10.1016/j.cpc.2007.02.034

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