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Planar magnetron sputtering cathode with deposition rate distribution controllability

✍ Scribed by Katsuo Abe; Shigeru Kobayashi; Tsuneaki Kamel; Tamotsu Shimizu; Hideki Tateishi; Susumu Aiuchi


Book ID
103423438
Publisher
Elsevier Science
Year
1982
Tongue
English
Weight
618 KB
Volume
96
Category
Article
ISSN
0040-6090

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