𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Phthalocyanines ultrathin alternating layer film on silicon, prepared by molecular beam deposition

✍ Scribed by T. Nonaka; T. Date; S. Tomita; N. Nagai; M. Nishimura; Y. Murata; A. Ishitani


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
416 KB
Volume
237
Category
Article
ISSN
0040-6090

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Ultrathin HfO2 films grown on silicon by
✍ E.P. Gusev; C. Cabral Jr.; M. Copel; C. D’Emic; M. Gribelyuk πŸ“‚ Article πŸ“… 2003 πŸ› Elsevier Science 🌐 English βš– 584 KB

We report on growth behavior, structure, thermal stability and electrical properties of ultrathin (,10 nm) hafnium oxide films deposited by atomic layer deposition using sequential exposures of HfCl and H O at 300 8C on a bare silicon surface 4 2 or a thin thermally grown SiO -based interlayer. Comp