Photothermally enabled lithography for refractive-index modulation in SU-8 photoresist

✍ Scribed by Ong, Biow Hiem; Yuan, Xiaocong; Tao, Shaohua; Tjin, Swee Chuan

• Book ID: 115428494
• Publisher: Optical Society of America
• Year: 2006
• Tongue: English
• Weight: 247 KB
• Volume: 31
• Category: Article
• ISSN: 0146-9592
• DOI: 10.1364/OL.31.001367