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Adjustable refractive index modulation for a waveguide with SU-8 photoresist by dual-UV exposure lithography

✍ Scribed by Ong, Biow Hiem ;Yuan, Xiaocong ;Tjin, Swee Chuan


Book ID
115353191
Publisher
The Optical Society
Year
2006
Tongue
English
Weight
660 KB
Volume
45
Category
Article
ISSN
1559-128X

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