Photoresist silylation and dry development for sub-micron photolithography : R. Zhou, D. W. E. Allsopp, M. E. Law, J. Wood and M. M. El Gomati. Vacuum 43(1/2), 83 (1992)

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 112 KB
• Volume: 32
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(92)90726-2