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Photoresist silylation and dry development for sub-micron photolithography

✍ Scribed by R Zhou; DWE Allsopp; ME Law; J Wood; MM El Gomati

Publisher: Elsevier Science
Year: 1992
Tongue: English
Weight: 767 KB
Volume: 43
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(92)90190-8

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Photoresist silylation and dry developme

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📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 112 KB