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Photoreflectance Characterization of Silicon Films on Insulator

✍ Scribed by Giordana, Adriana; Glosser, R.; Pellegrino, Joseph G.; Qadri, S.; Twigg, M. E.; Richmond, E. D.; Joyner, Keith; Pollack, Gordon

Book ID
121273954
Publisher
Cambridge University Press
Year
1990
Weight
316 KB
Volume
188
Category
Article
ISSN
0272-9172

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UV photoreflectance spectroscopy in stra
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## Abstract The optical modulation technique of photoreflectance (PR) is applied on tensely‐strained silicon on insulator (sSOI) substrates in order to determine the deformation potential in the strained silicon direct band gap. Raman spectroscopy is used for strain determination. A redshift of the