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Photoemission (XPS and XPD) study of epitaxial LaAlO3 film grown on SrTiO3(0 0 1)

✍ Scribed by M. El Kazzi; C. Merckling; G. Delhaye; L. Arzel; G. Grenet; E. Bergignat; G. Hollinger

Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 487 KB
Volume: 9
Category: Article
ISSN: 1369-8001
DOI: 10.1016/j.mssp.2006.10.044

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✦ Synopsis

This study investigates the tensile-strained growth of LaAlO 3 on SrTiO 3 (0 0 1) substrate by molecular beam epitaxy (MBE). Growth was controlled in situ by reflection high energy electron diffraction (RHEED). The characterization was carried out ex situ by photoemission and atomic force microscopy (AFM). Photoelectron spectroscopy (XPS) reveals the development of a TiO x -rich interface. Photoelectron diffraction (XPD) confirms that a 1.2-nm-thick pseudomorphic LaAlO 3 film has been grown on SrTiO 3 (0 0 1) substrate with a perpendicular lattice parameter of 0.37270.02 nm.

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Photoemission (XPS and XPD) study of epitaxial LaAlO3 film grown on SrTiO3(0&#xa0;0&#xa0;1)

✦ Synopsis

Photoemission (XPS and XPD) study of epitaxial LaAlO3 film grown on SrTiO3(0 0 1)