Photoemission study of ultra-thin vanadium films on Cu(100)

✍ Scribed by P Pervan; T Valla; M Milun

• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 300 KB
• Volume: 50
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/s0042-207x(98)00049-9

✦ Synopsis

The electronic properties of ultra-thin vanadium films grown on the Cu(100) surface are studied by means of angular photoemission spectroscopy (ARUPS). Vanadium films with nominal film thickens of 4 ML appear to have fully developed valence band characteristic for the bulk vanadium. Influence of hydrogen on the valence band spectrum of vanadium is discussed. Annealing of the V/Cu(100) introduces a segregation of copper on top of vanadium film. The copper films produced by the annealing at temperatures below 700 K appear to have different structure than the films obtained after annealing at higher temperatures. The thickness of the copper overlayer is estimated to be 2-3 ML.