๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Photoelectrochemical methods for semiconductor device processing

โœ Scribed by Paul A. Kohl; Derek B. Harris

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
538 KB
Volume
38
Category
Article
ISSN
0013-4686

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โœฆ Synopsis

usefulness and capabilities of photoelectrochemical processing of III-V semiconductors is presented. Examples include the etching of small period gratings, the formation of integral lenses, the decomposition of small bandgap semiconductors, the etching of ptype semiconductors, and the photoinitiated deposition of metal. The transport of carriers in the semiconductor and reactivity of the surfaces is discussed.

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Mixed finite volume methods for semicond
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โœ Riccardo Sacco; Fausto Saleri ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 689 KB

We deal with the two-dimensional numerical solution of the Van Roosbroeck system, widely employed in modern semiconductor device simulation. Using the well-known Gummel's decoupled algorithm leads to the iterative solution of a nonlinear Poisson equation for the electric potential and two linearized