๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

8607652 Process for manufacturing semiconductor devices

โœ Scribed by Yoshio UEKI; Sony Corporation

Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
116 KB
Volume
27
Category
Article
ISSN
0026-2714

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Semiconductor processing and manufacturi
Semiconductor processing and manufacturing
โœ William N. Shafarman; Bulent M. Basol; Jeff S. Britt; Robert B. Hall; Richard E. ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 155 KB

The viability of semiconductor deposition and treatment processes for manufacturing are assessed and critical issues identiยฎed for CdTe, Cu(InGa)Se 2 , thin ยฎlm silicon and amorphous silicon technologies. The focus is on increasing throughput and decreasing costs. Speciยฎc issues include deposition r

Photoelectrochemical methods for semicon
Photoelectrochemical methods for semiconductor device processing
โœ Paul A. Kohl; Derek B. Harris ๐Ÿ“‚ Article ๐Ÿ“… 1993 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 538 KB

usefulness and capabilities of photoelectrochemical processing of III-V semiconductors is presented. Examples include the etching of small period gratings, the formation of integral lenses, the decomposition of small bandgap semiconductors, the etching of ptype semiconductors, and the photoinitiated