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Photochemistry and Patterning of Self-Assembled Monolayer Films Containing Aromatic Hydrocarbon Functional Groups

✍ Scribed by Dulcey, Charles S.; Georger,, Jacque H.; Chen, Mu-San; McElvany, Stephen W.; O'Ferrall, C. Elizabeth; Benezra, Valarie I.; Calvert, Jeffrey M.


Book ID
126161821
Publisher
American Chemical Society
Year
1996
Tongue
English
Weight
367 KB
Volume
12
Category
Article
ISSN
0743-7463

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The 193 nm photochemistry of (aminoethylaminomethyl)phenethylsiloxane (PEDA) self-assembled monolayers (SAMs) under ambient conditions is described. The primary photodegradation pathways at low exposure doses (< 100 mJ cm -2 ) are benzylic C-N bond cleavage (ca. 68 %), with oxidation of the benzyl C