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Deep UV photochemistry and patterning of self-assembled monolayer films

✍ Scribed by J.M. Calvert; J.H. Georger; J.M. Schnur; P.E. Schoen; M.C. Peckerar; P.E. Pehrsson

Book ID
113205111
Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
452 KB
Volume
210-211
Category
Article
ISSN
0040-6090

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Deep-UV Photochemistry and Patterning of
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✍ M.-S. Chen; C. S. Dulcey; L. A. Chrisey; W. J. Dressick πŸ“‚ Article πŸ“… 2006 πŸ› John Wiley and Sons 🌐 English βš– 277 KB

The 193 nm photochemistry of (aminoethylaminomethyl)phenethylsiloxane (PEDA) self-assembled monolayers (SAMs) under ambient conditions is described. The primary photodegradation pathways at low exposure doses (< 100 mJ cm -2 ) are benzylic C-N bond cleavage (ca. 68 %), with oxidation of the benzyl C