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Photochemical studies of (aminoethylaminomethyl) phenethyltrimethoxysilane self-assembled monolayer films

โœ Scribed by Walter J. Dressick; Charles S. Dulcey; Mu-San Chen; Jeffrey M. Calvert


Book ID
114085995
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
579 KB
Volume
284-285
Category
Article
ISSN
0040-6090

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The 193 nm photochemistry of (aminoethylaminomethyl)phenethylsiloxane (PEDA) self-assembled monolayers (SAMs) under ambient conditions is described. The primary photodegradation pathways at low exposure doses (< 100 mJ cm -2 ) are benzylic C-N bond cleavage (ca. 68 %), with oxidation of the benzyl C