Deep-UV Photochemistry and Patterning of
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M.-S. Chen; C.โS. Dulcey; L.โA. Chrisey; W.โJ. Dressick
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Article
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2006
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John Wiley and Sons
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English
โ 277 KB
The 193 nm photochemistry of (aminoethylaminomethyl)phenethylsiloxane (PEDA) self-assembled monolayers (SAMs) under ambient conditions is described. The primary photodegradation pathways at low exposure doses (< 100 mJ cm -2 ) are benzylic C-N bond cleavage (ca. 68 %), with oxidation of the benzyl C