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Photochemical fabrication of SnO2 and tin micropatterns from SnI2 thin films

✍ Scribed by Titilayo A. Kuku; Mino Green

Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
96 KB
Volume
144
Category
Article
ISSN
0040-6090

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## Abstract Thin films of SnO~2~ have been successfully deposited by atomic layer deposition (ALD) using the SnI~4~/O~2~ precursor combination. Depositions were carried out in the temperature range 400–750 °C on SiO~2~/Si(100) and single‐crystalline α‐Al~2~O~3~(012) substrates. The films were found