Photocatalytic effect of thermal atomic layer deposition of TiO2 on stainless steel
β Scribed by Hyemin Kang; Chang-Soo Lee; Do-Young Kim; Jungwon Kim; Wonyong Choi; Hyungjun Kim
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 492 KB
- Volume
- 104
- Category
- Article
- ISSN
- 0926-3373
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TiO 2 films were grown on carbon fiber by atomic layer deposition (ALD), and adsorption and photocatalytic decomposition of methylene blue (MB) on these TiO 2 films were studied. They showed very high adsorption capacities of MB, indicating that these films can be used as adsorbents for removing org
TiO 2 layers were deposited by reactive pulse magnetron sputtering at a substrate temperature of 400 Β°C on float glass. The total pressure during the deposition was varied between 0.3 and 3 Pa for modification of the surface morphology. The morphology of 500 nm thick layers was analyzed by AFM and