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Photo-induced properties of thin TiO2 films deposited using the radio frequency plasma enhanced chemical vapor deposition method

✍ Scribed by Hieronim Szymanowski; Anna Sobczyk-Guzenda; Adam Rylski; Witold Jakubowski; Maciej Gazicki-Lipman; Uwe Herberth; Fethi Olcaytug

Book ID: 108289617
Publisher: Elsevier Science
Year: 2007
Tongue: English
Weight: 528 KB
Volume: 515
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2006.12.183

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