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Phase Separation and Formation of Silicides in Thin Films of Pd–W Alloys on Si

✍ Scribed by Rozhanskii, N. V. ;Lifshits, V. O.


Publisher
John Wiley and Sons
Year
1991
Tongue
English
Weight
471 KB
Volume
125
Category
Article
ISSN
0031-8965

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Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si have been investigated. Compressive stress induced by backside SiO 2 film on the silicon substrate was found to retard significantly the formation of Ni 2 Si, NiSi and NiSi 2 on (0 0 1)Si. On the other ha