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Phase formation in titanium after high-fluence oxygen ion implantation

✍ Scribed by C Hammerl; B Renner; B Rauschenbach; W Assmann


Book ID
114170611
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
295 KB
Volume
148
Category
Article
ISSN
0168-583X

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πŸ“œ SIMILAR VOLUMES


Phase formation in Ti after high fluence
✍ D. Manova; J.W. Gerlach; H. Neumann; W. Assmann; S. MΓ€ndl πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 377 KB

Nitrogen ion implantation in titanium using plasma immersion ion implantation (PIII) is investigated at a pulse voltage of 15 keV and elevated temperatures between 300 and 750 Β°C. Starting the implantation at room temperature leads to the parallel formation of TiN and Ti 2 N, as observed by X-ray di