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Performance of a time-of-flight spectrometer for thin film analysis by medium energy ion scattering

โœ Scribed by Marcus H. Mendenhall; Robert A. Weller


Book ID
113280487
Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
1017 KB
Volume
47
Category
Article
ISSN
0168-583X

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Hf x Si y O 1ร€xร€y layers with thicknesses of 2 and 10 nm were measured by medium energy ion scattering (MEIS) with a toroidal electrostatic analyzer (TEA), in which the yield of MEIS spectra was found to decrease with decreasing energy in contrast to conventional Rutherford backscattering spectromet