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PECVD of microcrystalline silicon carbon alloy thin films

✍ Scribed by Gautam Ganguly; S.C. De; Swati Ray; A.K. Barua


Book ID
115987191
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
175 KB
Volume
114
Category
Article
ISSN
0022-3093

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Laser annealing study of PECVD deposited
✍ U. Coscia; G. Ambrosone; F. Gesuele; V. Grossi; V. Parisi; S. Schutzmann; D.K. B πŸ“‚ Article πŸ“… 2007 πŸ› Elsevier Science 🌐 English βš– 524 KB

The influence of carbon content on the crystallization process has been investigated for the excimer laser annealed hydrogenated amorphous silicon carbon alloy films deposited by Plasma Enhanced Chemical Vapour Deposition (PECVD) technique, using silane methane gas mixture diluted in helium, as well